000			01280cam a2200325 a 4500
001			1652635
003			OSt
005			20210113162023.0
008			970415s1997 nyu b 001 0 eng
010			_a 97016114
020			_a0471177091 (cloth : alk. paper)
040			_aDLC _cATU _dDLC
050	0	0	_aT14.5 _b.W42 1997
082	0	0	_a155.9/1 _221
100	1		_aWeil, Michelle M. _98694
245	1	0	_aTechnoStress : _bcoping with technology @work @home @play / _cMichelle M. Weil, Larry D. Rosen.
246	3		_aTechno stress
260			_aNew York : _bJ. Wiley, _cc1997.
300			_axiii, 240 p. ; _c23 cm.
504			_aIncludes bibliographical references (p. 221-231) and index.
650		0	_aTechnology _xSocial aspects. _98676
650		0	_aTechnology _xPsychological aspects. _98695
650		0	_aStress (Psychology) _91208
700	1		_aRosen, Larry D. _98696
856	4		_3Table of Contents _uhttp://www.loc.gov/catdir/toc/onix01/97016114.html
856	4	2	_3Publisher description _uhttp://www.loc.gov/catdir/enhancements/fy0706/97016114-d.html
906			_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg
942			_2lcc _cBOOK
999			_c4462 _d4462